DELIVERING MEMS TO THE MASSES
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Table of Contents
The software is divided into modules, sections and topics. There are five modules namely mechanics, sensing, actuation, process and data analysis. Each module is divided into sections which is further divided into topics. Every topic has a corresponding help file which will be hyperlinked. The topic title and a short description  are also listed here.
Mechanics
Sensing
  • Piezoresistive
  • Capacitive
    • Acceleration
      • Static signal - Capacitive accelerometer for sensing a static signal
      • Step signal - Capacitive accelerometer for sensing a step signal
      • Pulse signal - Capacitive accelerometer for sensing a pulse signal

Actuation
  • Electrostatic
  • Thermal
    • Bimetallic - Design of a cantilever based bimetallic thermal actuator
    • Bimorph - Design of a thermal bimorph actuator

Process
  • Lithography
    • Spin resist - Spin coating of a thin film of photoresist
  • Oxidation
  • Diffusion
    • Diffusion - Diffusion profile for pre-deposition and drive-in in silicon
    • Diffusion mask - Silicon dioxide mask for high temperature diffusion
  • Implantation
    • Implantation - Ion implantation and drive-in of dopants in silicon
    • Implant mask - Mask thickness for selective implantation of dopants
  • Film Deposition
    • Film stress - Thin film stress calculated from wafer bow measurements
    • Metal
      • Evaporation - Deposition rate of metals using E-beam planetary evaporator
    • Polysilicon - Deposition rate of polysilicon using silane in a low pressure reactor
  • Wet etching
    • KOH etching - Etch rate of silicon and silicon dioxide in KOH
      • Membrane etch - Determine size of mask opening for membrane etch using KOH
    • Phosphoric acid - Etch rate of silicon nitride and silicon dioxide in phosphoric acid
    • Buffered HF - Etch rate of thermal oxide in buffered hydrofluoric acid (BOE)

Data Analysis
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