The software is divided into modules, sections and topics.
There are five modules namely mechanics, sensing, actuation, process and data
analysis. Each module is divided into sections which is further divided into
topics. Every topic has a corresponding help file which will be hyperlinked. The
topic title and a short description are also listed here.
Mechanics
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Structures
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Beams
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Cantilever
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Clamped beam
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Bent Beam - Design of a corner beam or bent beam
suspension
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Folded beam - Design of a folded beam suspension for
planar motion
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Serpentine beam - Design of a serpentine beam
suspension
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Torsion bar - Design of a torsion bar beam suspension
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Diaphragms
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Vibration
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Free vibration
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Cantilever
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Clamped beam
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Clamped beam - Free vibration frequency of a
double-clamped beam
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Central mass - Vibration frequency of a clamped beam
with a central mass
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With axial force - Resonant frequency of a clamped
beam with axial force
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Diaphragms
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Bent beam - Vibration frequency of a bent beam
suspension
-
Folded beam - Vibration frequency of a folded beam
suspension
-
Serpentine beam - Vibration frequency of a serpentine
beam suspension
-
With damping - Free vibration with damping
-
Forced vibration
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Damping
Sensing
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Piezoresistive
-
Capacitive
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Acceleration
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Static signal - Capacitive accelerometer for sensing a
static signal
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Step signal - Capacitive accelerometer for sensing a
step signal
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Pulse signal - Capacitive accelerometer for sensing a
pulse signal
Actuation
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Electrostatic
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Thermal
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Bimetallic - Design of a cantilever based bimetallic
thermal actuator
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Bimorph - Design of a thermal bimorph actuator
Process
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Lithography
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Spin resist - Spin coating of a
thin film of photoresist
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Oxidation
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Diffusion
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Diffusion - Diffusion profile for pre-deposition and
drive-in in silicon
-
Diffusion mask - Silicon dioxide mask for high
temperature diffusion
-
Implantation
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Implantation - Ion implantation and
drive-in of dopants in silicon
-
Implant mask - Mask thickness for
selective implantation of dopants
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Film Deposition
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Film stress - Thin film stress calculated from wafer
bow measurements
-
Metal
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Evaporation - Deposition rate of metals using E-beam
planetary evaporator
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Polysilicon - Deposition rate of
polysilicon using silane in a low pressure reactor
-
Wet etching
-
KOH etching - Etch rate of silicon
and silicon dioxide in KOH
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Membrane etch - Determine size of
mask opening for membrane etch using KOH
-
Phosphoric acid - Etch rate of silicon nitride and
silicon dioxide in phosphoric acid
-
Buffered HF - Etch rate of thermal
oxide in buffered hydrofluoric acid (BOE)
Data Analysis
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