This interface can be used to calculate the time required to produce a thin film of photoresist by spinning it on a substrate attached to a chuck. The resists spreads on the wafer due to the centrifugal force created by the rotation of the chuck. The spin time is nearly independent of the initial resist thickness especially at high thicknesses. The kinematic viscosity of the resist is given in centistokes (1cSt = 10-6 m2/s). Based on the desired thickness, viscosity of the resist and speed of rotation, the time of rotation can be set.
The plot gives the time of rotation required to produce a resist of a particular thickness. Thinner the resist, greater is the time required.